Imec and ASML Present Breakthrough in Semiconductor Research

The Belgian research institute imec, one of the leading semiconductor research facilities worldwide, reports a significant advancement in computer chip production. In collaboration with the Dutch company ASML, imec achieved remarkable results using ASML's latest €350 million chip printing machine. The new 'High NA' tool allowed imec to print circuits that are as small as or smaller than the current best in commercial production—in a single pass. This means leading semiconductor manufacturers will be able to produce generations of smaller and faster chips in the coming years. Luc Van den Hove, CEO of imec, stated that High NA is 'extremely important for the continued scaling of logic and memory technologies.' The tests also indicated that many additional chemicals and tools required for the chip manufacturing process appear ready for commercial use. ASML, as a leading supplier for computer chip manufacturing, dominates the market for lithography systems—large machines that use light beams to create circuits. The ability of the High NA tool to print smaller features in fewer steps not only promises cost savings for chip producers but also justifies the high price of the tool. As reported by Reuters on Monday, Intel has ordered the first two High NA tools, while TSMC—a key contract manufacturer for Nvidia and Apple—is expected to receive a third unit later this year. Mark Philips, Lithography Director at Intel, emphasized via email that a second tool is necessary to handle the required volume of wafers and experiments needed to support the development line. Other chip manufacturers that have already ordered a High NA tool include Samsung Electronics as well as memory specialists SK Hynix and Micron.